Invention Grant
- Patent Title: Sterilization method and plasma sterilization apparatus
- Patent Title (中): 灭菌方法和等离子灭菌装置
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Application No.: US12087583Application Date: 2007-01-11
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Publication No.: US08012415B2Publication Date: 2011-09-06
- Inventor: Yasushi Hanada , Nobuya Hayashi
- Applicant: Yasushi Hanada , Nobuya Hayashi
- Applicant Address: JP Osaka JP Saga
- Assignee: Elk Corporation,Saga University
- Current Assignee: Elk Corporation,Saga University
- Current Assignee Address: JP Osaka JP Saga
- Agency: Oliff & Berridge, PLC
- Priority: JP2006-004166 20060111
- International Application: PCT/JP2007/050205 WO 20070111
- International Announcement: WO2007/080907 WO 20070719
- Main IPC: A61L2/20
- IPC: A61L2/20 ; A61L2/00 ; A61L2/18 ; A61L9/00 ; B01J7/00

Abstract:
An object to be sterilized is disposed inside a vacuum chamber, and the inside of the vacuum chamber is evacuated. When the pressure inside the vacuum chamber reaches 3 Pa, a cutoff valve disposed between the vacuum chamber and the vacuum pump is closed. High-frequency power is supplied to an electrode. Oxygen gas is introduced into the vacuum chamber for 0.1 sec. Thereafter, the pressure is held constant for 3 sec. Until the pressure inside the vacuum chamber reaches 10 kPa, introduction of oxygen gas into the vacuum chamber is repeated. When the pressure reaches 10 kPa, the cutoff valve is opened to evacuate the inside of the vacuum chamber and the supply of the high-frequency power is stopped. Introducing the oxygen gas and determining pressure inside the vacuum chamber is repeated, and after 90 min, the pressure inside the vacuum chamber is returned to atmospheric pressure.
Public/Granted literature
- US20090053101A1 Sterilization Method and Plasma Sterilization Apparatus Public/Granted day:2009-02-26
Information query
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