Invention Grant
US08012546B2 Method and apparatus for producing semiconductor films and related devices
有权
用于制造半导体膜及相关器件的方法和装置
- Patent Title: Method and apparatus for producing semiconductor films and related devices
- Patent Title (中): 用于制造半导体膜及相关器件的方法和装置
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Application No.: US11843936Application Date: 2007-08-23
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Publication No.: US08012546B2Publication Date: 2011-09-06
- Inventor: Shogo Ishizuka , Shigeru Niki , Keiichiro Sakurai , Akimasa Yamada , Koji Matsubara
- Applicant: Shogo Ishizuka , Shigeru Niki , Keiichiro Sakurai , Akimasa Yamada , Koji Matsubara
- Applicant Address: JP
- Assignee: National Institute of Advanced Industrial Science and Technology
- Current Assignee: National Institute of Advanced Industrial Science and Technology
- Current Assignee Address: JP
- Agency: Ostrolenk Faber LLP
- Priority: JP2006-228342 20060824; JP2007-150108 20070606
- Main IPC: H05H1/24
- IPC: H05H1/24
Abstract:
A method for producing a semiconductor film having a chalcopyrite structure including a Ib group element, a IIIb group element and a VIb group element including selenium, the method including cracking selenium with plasma to generate radical selenium, and using the radical selenium in the process of forming the semiconductor film.
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