Invention Grant
- Patent Title: Light-sensitive component for use in photoresists
- Patent Title (中): 光敏元件用于光致抗蚀剂
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Application No.: US12084614Application Date: 2006-11-06
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Publication No.: US08012664B2Publication Date: 2011-09-06
- Inventor: Wolfgang Zahn , Ralf Grottenmüller , Dieter Wagner
- Applicant: Wolfgang Zahn , Ralf Grottenmüller , Dieter Wagner
- Applicant Address: US NJ Somerville
- Assignee: AZ Electronic Materials USA Corp.
- Current Assignee: AZ Electronic Materials USA Corp.
- Current Assignee Address: US NJ Somerville
- Agent Sangya Jain
- Priority: DE102005052885 20051107
- International Application: PCT/EP2006/010607 WO 20061106
- International Announcement: WO2007/051646 WO 20070510
- Main IPC: G03F7/023
- IPC: G03F7/023 ; G03F7/30 ; C07C245/12

Abstract:
A compound of the formula (I) where the symbols and indices are each defined as follows: A is A′, R or O—R; where R is a straight-chain, branched or cyclic, saturated or unsaturated aliphatic radical having 1-8 carbon atoms; A′ is the same or different and is B is a bond, —O—C(O)—, —C(O)—O—, —O—C(O)—, —C(O)—NH—, —NH—C(O)—, —C(O)—O—CH2—CH(OH)—CH2—O, —O—CH2—CH(OH)—CH2—O—(O)C—, —O—C(O)—O—, —O—C(O)—NH— or —NH—C(O)—O—; R1 is H or OH; m is 1, 2, 3, 4 or 5; Y is n is a positive rational number ≧3; E is the same or different and is —CH—CHR2—, —CHR2—CH2—, —CH2—CHR2—O—, —O—CHR2—CH2—, —(CH2)r—O— or —O—(CH2)—; R2 is H or CH3 and r is 1 or 4, is suitable as a light-sensitive component for photoresists.
Public/Granted literature
- US20090253073A1 Light-Sensitive Component for Use in Photoresists Public/Granted day:2009-10-08
Information query
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