Invention Grant
- Patent Title: Compositions and processes for photolithography
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Application No.: US11716910Application Date: 2007-03-12
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Publication No.: US08012666B2Publication Date: 2011-09-06
- Inventor: Michael K. Gallagher , Deyan Wang
- Applicant: Michael K. Gallagher , Deyan Wang
- Applicant Address: US MA Marlborough
- Assignee: Rohm and Haas Electronic Materials LLC
- Current Assignee: Rohm and Haas Electronic Materials LLC
- Current Assignee Address: US MA Marlborough
- Agency: The Dow Chemical Company
- Agent Peter F. Corless
- Main IPC: G03C5/00
- IPC: G03C5/00 ; G03C1/76 ; G03C1/492 ; G03C1/494
Abstract:
Overcoating layer compositions are provided that are applied above a photoresist composition including for immersion lithography processing as well as non-immersion imaging.
Public/Granted literature
- US20070212646A1 Compositions and processes for photolithography Public/Granted day:2007-09-13
Information query
