Invention Grant
- Patent Title: Method for manufacturing liquid discharge head
- Patent Title (中): 液体排放头的制造方法
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Application No.: US12769146Application Date: 2010-04-28
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Publication No.: US08012773B2Publication Date: 2011-09-06
- Inventor: Kazuhiro Hayakawa
- Applicant: Kazuhiro Hayakawa
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Fitzpatrick, Cella, Harper & Scinto
- Priority: JP2009-140151 20090611
- Main IPC: H01L21/302
- IPC: H01L21/302

Abstract:
A method for manufacturing a liquid discharge head includes providing a first layer containing a metal nitride to at least a portion on one surface of a silicon substrate corresponding to a supply port; providing a second layer on the first layer, the second layer including any one of aluminum, copper, and gold, or an alloy thereof; etching a portion of the silicon substrate corresponding to the supply port by reactive ion etching in a direction from the reverse surface towards the one surface so that the etched region reaches the first layer; and removing a portion of the first layer corresponding to the supply port and then removing a portion of the second layer corresponding to the supply port, thus forming the supply port.
Public/Granted literature
- US20100317130A1 METHOD FOR MANUFACTURING LIQUID DISCHARGE HEAD Public/Granted day:2010-12-16
Information query
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