Invention Grant
- Patent Title: Display substrate and method of manufacturing the same
- Patent Title (中): 显示基板及其制造方法
-
Application No.: US11644195Application Date: 2006-12-21
-
Publication No.: US08012813B2Publication Date: 2011-09-06
- Inventor: Eun-Guk Lee
- Applicant: Eun-Guk Lee
- Applicant Address: KR
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR
- Agency: Innovation Counsel LLP
- Priority: KR10-2005-0127121 20051221
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L21/84

Abstract:
A three mask process for forming an LCD substrate includes, depositing in sequence on a base substrate a gate metallic layer, a gate insulation layer and a channel layer. A first photoresist pattern is used to form a gate electrode of a switching device, a channel pattern and a gate line on the gate electrode. A transparent conductive layer and a source metallic layer are deposited in sequence on the base substrate having the channel pattern. A source electrode and a drain electrode of the switching device, a pixel electrode and a source line electronically connected to the drain electrode, are formed by a second photoresist pattern. A first protective insulation layer is formed, and the first protective insulation layer on the pixel electrode is removed by a third photoresist pattern. Therefore, by the three masks process yields a simplified manufacturing process in which the lower portion of the source metallic pattern is not formed and display quality is improved.
Public/Granted literature
- US20070166895A1 Display substrate and method of manufacturing the same Public/Granted day:2007-07-19
Information query
IPC分类: