Invention Grant
- Patent Title: Array substrate and method for fabricating thereof
- Patent Title (中): 阵列基板及其制造方法
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Application No.: US12837787Application Date: 2010-07-16
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Publication No.: US08012815B2Publication Date: 2011-09-06
- Inventor: Chih-Hung Shih , Ming-Yuan Huang , Chih-Chun Yang
- Applicant: Chih-Hung Shih , Ming-Yuan Huang , Chih-Chun Yang
- Applicant Address: TW Hsinchu
- Assignee: Au Optronics Corp.
- Current Assignee: Au Optronics Corp.
- Current Assignee Address: TW Hsinchu
- Agency: Thomas|Kayden
- Priority: TW95126510A 20060720
- Main IPC: H01L21/84
- IPC: H01L21/84

Abstract:
The invention provides a method for manufacturing an array substrate utilizing a laser ablation process. A conductive layer can be selectively patterned by the laser ablation process without a photo mask due to different adhesions between the conductive layer and other materials. The patterned conductive layer thus formed adjoins an inorganic passivation layer to provide a substantially continuous surface.
Public/Granted literature
- US20100285623A1 Array Substrate and Method for Fabricating Thereof Public/Granted day:2010-11-11
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