Invention Grant
- Patent Title: Method of high voltage operation of field effect transistor
- Patent Title (中): 场效应晶体管的高电压运行方法
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Application No.: US12283639Application Date: 2008-09-12
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Publication No.: US08012835B2Publication Date: 2011-09-06
- Inventor: Yutaka Hayashi , Hisashi Hasegawa , Yoshifumi Yoshida , Jun Osanai
- Applicant: Yutaka Hayashi , Hisashi Hasegawa , Yoshifumi Yoshida , Jun Osanai
- Applicant Address: JP JP
- Assignee: Seiko Instruments Inc.,Yutaka Hayashi
- Current Assignee: Seiko Instruments Inc.,Yutaka Hayashi
- Current Assignee Address: JP JP
- Agency: Adams & Wilks
- Priority: JP2004-048667 20040224; JP2004-318751 20041102
- Main IPC: H01L21/8234
- IPC: H01L21/8234

Abstract:
A high voltage operating field effect transistor has a source region and a drain region spaced apart from each other in a surface of a substrate. The source region is operative to receive at least one of a signal electric potential and a signal current. A semiconductor channel formation region is disposed in the surface of the substrate between the source region and the drain region. A gate region is disposed above the channel formation region and is operative to receive a bias electric potential having an absolute value equal to or larger than a first constant electric potential which changes according to an increase or decrease in a drain electric potential. A gate insulating film region is disposed between the channel formation region and the gate region.
Public/Granted literature
- US20090014765A1 High voltage operating field effect transistor, bias circuit therefor and high voltage circuit thereof Public/Granted day:2009-01-15
Information query
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