Invention Grant
- Patent Title: Delivery of vapor precursor from solid source
- Patent Title (中): 从固体源输送蒸气前体
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Application No.: US12326792Application Date: 2008-12-02
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Publication No.: US08012876B2Publication Date: 2011-09-06
- Inventor: Theodorus G. M. Oosterlaken
- Applicant: Theodorus G. M. Oosterlaken
- Applicant Address: NL
- Assignee: ASM International N.V.
- Current Assignee: ASM International N.V.
- Current Assignee Address: NL
- Agency: Knobbe, Martens, Olson & Bear LLP
- Main IPC: H01L21/44
- IPC: H01L21/44 ; H01L29/40

Abstract:
A method is disclosed that uses solid precursors for semiconductor processing. A solid precursor is provided in a storage container. The solid precursor is transformed into a liquid state in the storage container. The liquid state precursor is transported from the storage container to a liquid holding container. The liquid state precursor is transported from the liquid holding container to a reaction chamber. The molten precursor allows the precursor to be metered in the liquid state. The storage container can be heated only when necessary to replenish the liquid holding container, thereby reducing the possibility of thermal decomposition of the precursor.
Public/Granted literature
- US20100136772A1 DELIVERY OF VAPOR PRECURSOR FROM SOLID SOURCE Public/Granted day:2010-06-03
Information query
IPC分类: