Exemplary embodiments provide a method for fabricating an integrated circuit (IC) device with reduced streak defects. In one embodiment, the IC device structure can be formed having a first pad oxide-based layer on a front side of a semiconductor substrate and having an oxide-nitride-based structure on a backside of the semiconductor substrate. The IC device structure can be etched to remove a nitride-related material from the backside oxide-nitride-based structure, and further to remove the first pad oxide-based layer from the front side of the semiconductor substrate. On the removed front side of the semiconductor substrate a second pad oxide-based layer can be formed, e.g., for forming an isolation structure for device component or circuitry isolation.