Invention Grant
- Patent Title: Insulating film forming composition and production method of insulating film
- Patent Title (中): 绝缘膜成型组成及绝缘膜的制造方法
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Application No.: US12040951Application Date: 2008-03-03
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Publication No.: US08013077B2Publication Date: 2011-09-06
- Inventor: Kensuke Morita
- Applicant: Kensuke Morita
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2007-052630 20070302; JP2007-052631 20070302
- Main IPC: C08F283/04
- IPC: C08F283/04
Abstract:
An insulating film forming composition, includes: a polymer compound obtained by polymerizing a cage-type silsesquioxane compound having two or more unsaturated groups as substituents; a heat-resistant organic polymer compound having a carbon-carbon unsaturated bond; and an organic solvent, and a method for producing an insulating film, includes: coating the insulating film forming composition on a substrate; and then curing the coating.
Public/Granted literature
- US20080213492A1 INSULATING FILM FORMING COMPOSITION AND PRODUCTION METHOD OF INSULATING FILM Public/Granted day:2008-09-04
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