Invention Grant
US08013273B2 Method for manufacturing absorption pad 有权
吸收垫制造方法

  • Patent Title: Method for manufacturing absorption pad
  • Patent Title (中): 吸收垫制造方法
  • Application No.: US11796000
    Application Date: 2006-01-26
  • Publication No.: US08013273B2
    Publication Date: 2011-09-06
  • Inventor: Nho-Kwon Kwak
  • Applicant: Nho-Kwon Kwak
  • Applicant Address: KR Incheon
  • Assignee: Hanmi Semiconductor, Inc.
  • Current Assignee: Hanmi Semiconductor, Inc.
  • Current Assignee Address: KR Incheon
  • Agency: Sherr & Vaughn, PLLC
  • Priority: KR10-2005-0007947 20050128; KR10-2005-0067293 20050725
  • International Application: PCT/KR2006/000309 WO 20060126
  • International Announcement: WO2006/080815 WO 20060803
  • Main IPC: B23K26/38
  • IPC: B23K26/38
Method for manufacturing absorption pad
Abstract:
Disclosed are an apparatus and a method for manufacturing an absorption pad used for picking up a package or a strip during a semiconductor manufacturing process. The apparatus includes a workpiece transfer device on which a workpiece is mounted, a laser generator installed above the workpiece transfer device while being spaced apart from the workpiece transfer device by a predetermined distance, a driving unit for moving the workpiece transfer device and the laser generator relative to each other, and a controller for controlling the laser generator. It is possible to precisely form patterns having various sizes and shapes according to use of the absorption pad and the size of the package. Processing conditions for the workpiece are standardized, so that the processing time and manufacturing cost for the absorption pad are minimized.
Public/Granted literature
Information query
Patent Agency Ranking
0/0