Invention Grant
US08013377B2 Method for producing an integrated circuit and arrangement comprising a substrate 有权
一种用于制造集成电路的方法和包括衬底的装置

Method for producing an integrated circuit and arrangement comprising a substrate
Abstract:
Embodiments of the invention relate to an integrated circuit comprising a carrier, having a capacitor with a first electrode and a second electrode. The first electrode has a dielectric layer A layer sequence is arranged on the carrier, the capacitor being introduced in said layer sequence, wherein the layer sequence has a first supporting layer and a second supporting layer arranged at a distance above the first supporting layer, wherein the first and the second supporting layer adjoin the first electrode of the capacitor. Methods of manufacturing the integrated circuit are also provided.
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