Invention Grant
US08013377B2 Method for producing an integrated circuit and arrangement comprising a substrate
有权
一种用于制造集成电路的方法和包括衬底的装置
- Patent Title: Method for producing an integrated circuit and arrangement comprising a substrate
- Patent Title (中): 一种用于制造集成电路的方法和包括衬底的装置
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Application No.: US12269612Application Date: 2008-11-12
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Publication No.: US08013377B2Publication Date: 2011-09-06
- Inventor: Peter Baars , Stefan Tegen , Klaus Muemmler
- Applicant: Peter Baars , Stefan Tegen , Klaus Muemmler
- Applicant Address: DE Munich
- Assignee: Qimonda AG
- Current Assignee: Qimonda AG
- Current Assignee Address: DE Munich
- Agency: Patterson & Sheridan, LLP
- Priority: DE102007054077 20071113
- Main IPC: H01L27/108
- IPC: H01L27/108 ; H01L29/76 ; H01L29/94 ; H01L31/119

Abstract:
Embodiments of the invention relate to an integrated circuit comprising a carrier, having a capacitor with a first electrode and a second electrode. The first electrode has a dielectric layer A layer sequence is arranged on the carrier, the capacitor being introduced in said layer sequence, wherein the layer sequence has a first supporting layer and a second supporting layer arranged at a distance above the first supporting layer, wherein the first and the second supporting layer adjoin the first electrode of the capacitor. Methods of manufacturing the integrated circuit are also provided.
Public/Granted literature
- US20090121315A1 METHOD FOR PRODUCING AN INTEGRATED CIRCUIT AND ARRANGEMENT COMPRISING A SUBSTRATE Public/Granted day:2009-05-14
Information query
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