Invention Grant
US08013414B2 Gallium nitride semiconductor device with improved forward conduction
有权
具有改善的正向传导的氮化镓半导体器件
- Patent Title: Gallium nitride semiconductor device with improved forward conduction
- Patent Title (中): 具有改善的正向传导的氮化镓半导体器件
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Application No.: US12388402Application Date: 2009-02-18
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Publication No.: US08013414B2Publication Date: 2011-09-06
- Inventor: TingGang Zhu
- Applicant: TingGang Zhu
- Applicant Address: US CA Sunnyvale
- Assignee: Alpha & Omega Semiconductor, Inc.
- Current Assignee: Alpha & Omega Semiconductor, Inc.
- Current Assignee Address: US CA Sunnyvale
- Agency: Patent Law Group LLP
- Agent Carmen C. Cook
- Main IPC: H01L27/095
- IPC: H01L27/095 ; H01L29/47

Abstract:
A gallium nitride based semiconductor diode includes a substrate, a semiconductor body including a first heavily doped GaN layer and a second lightly doped GaN layer. The semiconductor body includes mesas projecting upwardly from a lower surface where each of the mesas includes the second GaN layer and a portion of the first GaN layer. Schottky contacts are formed on the upper surface of the mesas and ohmic contacts are formed on the lower surface of the semiconductor body. An insulating layer is formed over the Schottky and ohmic contacts and vias are formed in the insulating layer to the Schottky and Ohmic contacts. An anode electrode is formed in a first metal pad in electrical contact with the Schottky contacts. A cathode electrode is formed in a second metal pad in electrical contact with the ohmic contacts.
Public/Granted literature
- US20100207232A1 Gallium Nitride Semiconductor Device With Improved Forward Conduction Public/Granted day:2010-08-19
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