Invention Grant
- Patent Title: Solder joints with enhanced electromigration resistance
- Patent Title (中): 具有增强的电迁移阻力的焊点
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Application No.: US12344194Application Date: 2008-12-24
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Publication No.: US08013444B2Publication Date: 2011-09-06
- Inventor: Mengzhi Pang , Pilin Liu , Charavanakumara Gurumurthy
- Applicant: Mengzhi Pang , Pilin Liu , Charavanakumara Gurumurthy
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Agency: Konrad Raynes & Victor, LLP
- Agent Alan S. Raynes
- Main IPC: H01L23/488
- IPC: H01L23/488 ; B23K1/00

Abstract:
Electronic assemblies and solders used in electronic assemblies are described. One embodiment includes a die and a substrate, with a solder material positioned between the die and the substrate, the solder comprising at least 91 weight percent Sn, 0.4 to 1.0 weight percent Cu and at least one dopant selected from the group consisting of Ag, Bi, P, and Co. Other embodiments are described and claimed.
Public/Granted literature
- US20100155947A1 SOLDER JOINTS WITH ENHANCED ELECTROMIGRATION RESISTANCE Public/Granted day:2010-06-24
Information query
IPC分类: