Invention Grant
- Patent Title: Beam illumination system and method for producing printing plates
- Patent Title (中): 光束照明系统及印版生产方法
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Application No.: US11840796Application Date: 2007-08-17
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Publication No.: US08013887B2Publication Date: 2011-09-06
- Inventor: Wolfgang Sievers
- Applicant: Wolfgang Sievers
- Applicant Address: DE Itzehoe
- Assignee: Esko-Graphics Imaging GmbH
- Current Assignee: Esko-Graphics Imaging GmbH
- Current Assignee Address: DE Itzehoe
- Agency: Inventek
- Agent Dov Rosenfeld
- Main IPC: B41J2/455
- IPC: B41J2/455

Abstract:
Images are transferred to printing plates by illuminating light-responsive materials with patterns corresponding to the images to be printed. The present invention provides for the transferring of an image by the combined flux from two or more beams of light. Particular embodiments ablate the mask printing plates for CTP systems by the combined illumination from a first, broad beam and a plurality of controllable, pulsed beams that co-illuminate the plate with the first beam. The resulting system and method is less expensive than the prior art and produces a printing plate more efficiently and with improved productivity than the prior art.
Public/Granted literature
- US20080030569A1 BEAM ILLUMINATION SYSTEM AND METHOD FOR PRODUCING PRINTING PLATES Public/Granted day:2008-02-07
Information query
IPC分类: