Invention Grant
US08014126B2 Electronic device and production method thereof 有权
电子装置及其制造方法

  • Patent Title: Electronic device and production method thereof
  • Patent Title (中): 电子装置及其制造方法
  • Application No.: US11922697
    Application Date: 2006-06-23
  • Publication No.: US08014126B2
    Publication Date: 2011-09-06
  • Inventor: Shigeki SatoKeiichi Fukuda
  • Applicant: Shigeki SatoKeiichi Fukuda
  • Applicant Address: JP Tokyo
  • Assignee: TDK Corporation
  • Current Assignee: TDK Corporation
  • Current Assignee Address: JP Tokyo
  • Agency: Oliff & Berridge, PLC
  • Priority: JP2005-185749 20050624
  • International Application: PCT/JP2006/312643 WO 20060623
  • International Announcement: WO2006/137533 WO 20061228
  • Main IPC: H01G4/06
  • IPC: H01G4/06
Electronic device and production method thereof
Abstract:
Electronic device 1 comprises an element body 10, comprising a dielectric layer 2 constituted by a dielectric ceramic composition, and a terminal electrode 4, formed outside of the element body 10. The dielectric ceramic composition comprised a main component including barium titanate; a first subcomponent including at least one oxide of Mg and Ca; a second subcomponent including SiO2; a third subcomponent including at least one oxide of Mn and Cr; and a fourth subcomponent including an oxide of rare earth elements, wherein the net valence of Mn and/or Cr in the third subcomponent is 2.2 to 2.4. According to the electronic device 1, both high temperature accelerated lifetime characteristics and capacity stress aging characteristics can be improved in a balanced manner.
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