Invention Grant
- Patent Title: Lithographic apparatus and device manufacturing method
- Patent Title (中): 平版印刷设备和器件制造方法
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Application No.: US11706422Application Date: 2007-02-15
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Publication No.: US08014881B2Publication Date: 2011-09-06
- Inventor: Mark Constant Johannes Baggen , Petrus Marinus Christianus Maria Van Den Biggelaar , Yin Tim Tso , Marcel François Heertjes , Ramidin Izair Kamidi , Dennis Andreas Petrus Hubertina Houben , Constant Paul Marie Jozef Baggen , Marinus Jacobus Gerardus Van De Molengraft
- Applicant: Mark Constant Johannes Baggen , Petrus Marinus Christianus Maria Van Den Biggelaar , Yin Tim Tso , Marcel François Heertjes , Ramidin Izair Kamidi , Dennis Andreas Petrus Hubertina Houben , Constant Paul Marie Jozef Baggen , Marinus Jacobus Gerardus Van De Molengraft
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Main IPC: G05B13/02
- IPC: G05B13/02 ; B41F1/18 ; C11D7/26 ; H03L7/00 ; G03B27/72 ; G03C1/06

Abstract:
In a lithographic apparatus, a feedforward transfer function of a control system is determined by: a) iteratively learning a feedforward output signal of the control system by iterative learning control for a given setpoint signal; b) determining a relation between the learned feedforward output signal and the setpoint signal; and c) applying the relation as the feedforward transfer function of the control system. A learned feedforward, which has been learned for one or more specific setpoint signals only, can be adapted to provide a setpoint signal dependent feedforward output signal. The learned feedforward can be made more robust against setpoint variations.
Public/Granted literature
- US20080200998A1 Lithographic apparatus and device manufacturing method Public/Granted day:2008-08-21
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