Invention Grant
- Patent Title: Film removing device and film removing method
- Patent Title (中): 薄膜去除装置和薄膜去除方法
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Application No.: US11831190Application Date: 2007-07-31
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Publication No.: US08016976B2Publication Date: 2011-09-13
- Inventor: Shigenori Kamei , Kotaro Ooishi , Masahito Hamada
- Applicant: Shigenori Kamei , Kotaro Ooishi , Masahito Hamada
- Applicant Address: JP Tokyo-To
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo-To
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2006-209421 20060801
- Main IPC: B29C63/00
- IPC: B29C63/00

Abstract:
A film removing device includes an approach stage having a flat approach part having a surface substantially flush with the surface of a substrate supported on a support member. The flat approach part faces a first side surface of the substrate at a corner of the substrate where the first side surface and a second side surface of the substrate join. A film removing nozzle spouts a solvent toward a peripheral part of the substrate and sucks a solution while being moved along the second side surface and the approach stage. A gas is spouted into a gap between the flat approach part and the corner of the substrate so that the gas flows through the gap toward the second side surface.
Public/Granted literature
- US20080041523A1 FILM REMOVING DEVICE AND FILM REMOVING METHOD Public/Granted day:2008-02-21
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