Invention Grant
- Patent Title: Self cleaning aluminum alloy substrates
- Patent Title (中): 自清洁铝合金基板
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Application No.: US11952333Application Date: 2007-12-07
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Publication No.: US08017247B2Publication Date: 2011-09-13
- Inventor: Albert L. Askin , Verne Bergstrom , Robert E. Bombalski , Paula L. Kolek , Nickolas C. Kotow , Marlene A. Thompson , Jean Ann Skiles , Luis F. Vega , James M. Marinelli , Daniel Serafin
- Applicant: Albert L. Askin , Verne Bergstrom , Robert E. Bombalski , Paula L. Kolek , Nickolas C. Kotow , Marlene A. Thompson , Jean Ann Skiles , Luis F. Vega , James M. Marinelli , Daniel Serafin
- Applicant Address: US PA Pittsburgh
- Assignee: Alcoa Inc.
- Current Assignee: Alcoa Inc.
- Current Assignee Address: US PA Pittsburgh
- Agency: Greenberg Traurig LLP
- Main IPC: B32B9/00
- IPC: B32B9/00

Abstract:
Self-cleaning aluminum alloy substrates and methods of making the same are disclosed. In one embodiment, a substrate is provided, the substrate including an aluminum alloy body, an anodic oxide zone having micropores within a surface of the aluminum alloy body, the anodic oxide zone being substantially impermeable to contaminants, and a photocatalytic film located on at least a portion of the anodic oxide zone, wherein the photocatalytic film comprises photocatalytically active semiconductor. In one embodiment, a method is provided, the method including the steps of forming an anodic oxide zone in at least a portion of an aluminum alloy base, forming a photocatalytic film, the photocatalytic film being located on the anodic oxide zone, and sealing the anodic oxide zone with a sealant, wherein, as sealed, the anodic oxide zone is substantially impermeable to contaminants.
Public/Granted literature
- US20080241573A1 SELF CLEANING ALUMINUM ALLOY SUBSTRATES Public/Granted day:2008-10-02
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