Invention Grant
- Patent Title: Dual carrier for joining IC die or wafers to TSV wafers
- Patent Title (中): 用于将IC芯片或晶片连接到TSV晶片的双载体
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Application No.: US12694012Application Date: 2010-01-26
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Publication No.: US08017439B2Publication Date: 2011-09-13
- Inventor: Yoshimi Takahashi , Masood Murtuza , Rajiv Dunne , Satyendra Singh Chauhan
- Applicant: Yoshimi Takahashi , Masood Murtuza , Rajiv Dunne , Satyendra Singh Chauhan
- Applicant Address: US TX Dallas
- Assignee: Texas Instruments Incorporated
- Current Assignee: Texas Instruments Incorporated
- Current Assignee Address: US TX Dallas
- Agent Yingsheng Tung; Wade J. Brady III; Frederick J. Telecky, Jr.
- Main IPC: H01L21/44
- IPC: H01L21/44

Abstract:
A method of forming stacked electronic articles using a through substrate via (TSV) wafer includes mounting a first carrier wafer to a top side of the TSV wafer using a first adhesive material that has a first debonding temperature. The TSV wafer is thinned from a bottom side of the TSV wafer to form a thinned TSV wafer. A second carrier wafer is mounted to the bottom side of the TSV wafer using a second adhesive material that has a second debonding temperature that is higher as compared to the first debonding temperature. The thinned TSV wafer is heated to a temperature above the first debonding temperature to remove the first carrier wafer from the thinned TSV wafer. At least one singulated IC die is bonded to TSV die formed on the top surface of the thinned TSV wafer to form the stacked electronic article.
Public/Granted literature
- US20110183464A1 DUAL CARRIER FOR JOINING IC DIE OR WAFERS TO TSV WAFERS Public/Granted day:2011-07-28
Information query
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