Invention Grant
- Patent Title: Method and system for scatter correction
- Patent Title (中): 散射校正的方法和系统
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Application No.: US12270437Application Date: 2008-11-13
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Publication No.: US08017914B2Publication Date: 2011-09-13
- Inventor: Scott David Wollenweber , David Leo McDaniel , Charles William Stearns
- Applicant: Scott David Wollenweber , David Leo McDaniel , Charles William Stearns
- Applicant Address: US NY Schenectady
- Assignee: General Electric Company
- Current Assignee: General Electric Company
- Current Assignee Address: US NY Schenectady
- Agency: The Small Patent Law Group
- Agent Dean Small
- Main IPC: G01T1/166
- IPC: G01T1/166
Abstract:
A method and apparatus are provided for correcting primary and secondary emission data. The method includes obtaining an emission data set having primary and secondary emission data representative of primary and secondary emission particles emitting from a region of interest and applying a scatter correction model to the emission data set to derive an estimated scatter vector. The method also includes comparing the emission data set to the estimated scatter vector to identify an amount of secondary emission data in the emission data set and correcting the emission data set based on the amount of secondary emission data identified in the comparing operation.
Public/Granted literature
- US20100116994A1 METHOD AND SYSTEM FOR SCATTER CORRECTION Public/Granted day:2010-05-13
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