Invention Grant
US08018024B2 P-i-n diode crystallized adjacent to a silicide in series with a dielectric antifuse
有权
P-i-n二极管与硅化物结晶,与绝缘反熔丝串联
- Patent Title: P-i-n diode crystallized adjacent to a silicide in series with a dielectric antifuse
- Patent Title (中): P-i-n二极管与硅化物结晶,与绝缘反熔丝串联
-
Application No.: US11560289Application Date: 2006-11-15
-
Publication No.: US08018024B2Publication Date: 2011-09-13
- Inventor: S. Brad Herner
- Applicant: S. Brad Herner
- Applicant Address: US CA Milpitas
- Assignee: SanDisk 3D LLC
- Current Assignee: SanDisk 3D LLC
- Current Assignee Address: US CA Milpitas
- Agency: Dugan & Dugan, PC
- Main IPC: H01L29/00
- IPC: H01L29/00

Abstract:
A method is described for forming a nonvolatile one-time-programmable memory cell having reduced programming voltage. A contiguous p-i-n diode is paired with a dielectric rupture antifuse formed of a high-dielectric-constant material, having a dielectric constant greater than about 8. In preferred embodiments, the high-dielectric-constant material is formed by atomic layer deposition. The diode is preferably formed of deposited low-defect semiconductor material, crystallized in contact with a silicide. A monolithic three dimensional memory array of such cells can be formed in stacked memory levels above the wafer substrate.
Public/Granted literature
- US20070069217A1 P-I-N DIODE CRYSTALLIZED ADJACENT TO A SILICIDE IN SERIES WITH A DIELECTRIC ANITFUSE Public/Granted day:2007-03-29
Information query
IPC分类: