Invention Grant
- Patent Title: Exposure apparatus and device fabrication method
- Patent Title (中): 曝光装置和装置制造方法
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Application No.: US11808406Application Date: 2007-06-08
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Publication No.: US08018570B2Publication Date: 2011-09-13
- Inventor: Masaomi Kameyama
- Applicant: Masaomi Kameyama
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, PLC
- Priority: JP2003-083329 20030325
- Main IPC: G03B27/32
- IPC: G03B27/32 ; G03B27/42 ; G03B27/52 ; G03B27/58
Abstract:
This exposure system projects a pattern image onto a substrate via a projection optical system and a liquid to expose the substrate, with a space between the projection optical system and the substrate filled with the liquid. The exposure system is provided with a vaporization preventing unit for preventing the vaporization of the liquid.
Public/Granted literature
- US20080030697A1 Exposure apparatus and device fabrication method Public/Granted day:2008-02-07
Information query
