Invention Grant
- Patent Title: Pellicle, lithographic apparatus and device manufacturing method
- Patent Title (中): 薄膜，光刻设备和器件制造方法
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Application No.: US11785744Application Date: 2007-04-19
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Publication No.: US08018578B2Publication Date: 2011-09-13
- Inventor: Vadim Yevgenyevich Banine , Arno Jan Bleeker
- Applicant: Vadim Yevgenyevich Banine , Arno Jan Bleeker
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: F21V9/04
- IPC: F21V9/04 ; F21V9/06 ; G02B5/20 ; G03B27/32 ; G03B27/42 ; G03B27/52 ; G03B27/54
Abstract:
A pellicle for integrated circuit equipment operating in an EUV range includes a multi-layered structure of alternating layers. The pellicle is constructed and arranged to reflect or absorb undesired radiation and to intercept debris to enhance the spectral purity of a radiation beam.
Public/Granted literature
- US20080259291A1 Pellicle, lithographic apparatus and device manufacturing method Public/Granted day:2008-10-23
Information query
