Invention Grant
- Patent Title: Optical arrangement of autofocus elements for use with immersion lithography
- Patent Title (中): 用于浸没光刻的自动对焦元件的光学布置
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Application No.: US12457742Application Date: 2009-06-19
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Publication No.: US08018657B2Publication Date: 2011-09-13
- Inventor: W. Thomas Novak
- Applicant: W. Thomas Novak
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, PLC
- Main IPC: G02B3/12
- IPC: G02B3/12
Abstract:
A lithographic projection apparatus includes an optical element through which a substrate is exposed with an exposure beam. A space between the optical element and the substrate is filled with liquid during the exposure. In addition, a gap is formed between a member and a surface, through which the exposure beam does not pass, of the optical element. A suction is provided to the gap.
Public/Granted literature
- US20090262322A1 Optical arrangement of autofocus elements for use with immersion lithography Public/Granted day:2009-10-22
Information query
IPC分类:
| G | 物理 |
| G02 | 光学 |
| G02B | 光学元件、系统或仪器 |
| G02B3/00 | 简单或复合透镜 |
| G02B3/12 | .充入液体或抽空的透镜 |
