Invention Grant
- Patent Title: Curable composition for nanoimprint, and patterning method
- Patent Title (中): 纳米压印的可固化组合物和图案化方法
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Application No.: US12472023Application Date: 2009-05-26
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Publication No.: US08025833B2Publication Date: 2011-09-27
- Inventor: Kunihiko Kodama , Akinori Fujita , Tadashi Oomatsu , Akiyoshi Goto
- Applicant: Kunihiko Kodama , Akinori Fujita , Tadashi Oomatsu , Akiyoshi Goto
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2008-030854 20080212; JP2008-207844 20080812
- Main IPC: B29C35/08
- IPC: B29C35/08 ; G03F7/00
Abstract:
A curable composition for nanoimprints which comprises a polycyclic aromatic structure-having polymerizable monomer and a photopolymerization initiator is excellent in mold releasability, etching resistance and solvent resistance and capable of forming patterns.
Public/Granted literature
- US20090283937A1 CURABLE COMPOSITION FOR NANOIMPRINT, AND PATTERNING METHOD Public/Granted day:2009-11-19
Information query
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