Invention Grant
US08026038B2 Metal oxide-containing film-forming composition, metal oxide-containing film, metal oxide-containing film-bearing substrate, and patterning method
有权
含有金属氧化物的成膜组合物，含金属氧化物的膜，含金属氧化物的含膜基材和图案化方法
- Patent Title: Metal oxide-containing film-forming composition, metal oxide-containing film, metal oxide-containing film-bearing substrate, and patterning method
- Patent Title (中): 含有金属氧化物的成膜组合物，含金属氧化物的膜，含金属氧化物的含膜基材和图案化方法
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Application No.: US12275088Application Date: 2008-11-20
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Publication No.: US08026038B2Publication Date: 2011-09-27
- Inventor: Tsutomu Ogihara , Takafumi Ueda , Toshiharu Yano , Mutsuo Nakashima
- Applicant: Tsutomu Ogihara , Takafumi Ueda , Toshiharu Yano , Mutsuo Nakashima
- Applicant Address: JP Tokyo
- Assignee: Shin-Etsu Chemical Co., Ltd.
- Current Assignee: Shin-Etsu Chemical Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2007-303130 20071122
- Main IPC: G03F7/00
- IPC: G03F7/00 ; G03F7/004 ; G03F7/26 ; G03F7/11 ; G03F7/40
Abstract:
A metal oxide-containing film is formed from a heat curable composition comprising (A) a metal oxide-containing compound obtained through hydrolytic condensation between a hydrolyzable silicon compound and a hydrolyzable metal compound, (B) a hydroxide or organic acid salt of Li, Na, K, Rb or Cs, or a sulfonium, iodonium or ammonium compound, (C) an organic acid, and (D) an organic solvent. The metal oxide-containing film ensures effective pattern formation.
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