Invention Grant
US08026604B2 Semiconductor devices having contact holes including protrusions exposing contact pads
有权
具有接触孔的半导体器件包括暴露接触焊盘的突起
- Patent Title: Semiconductor devices having contact holes including protrusions exposing contact pads
- Patent Title (中): 具有接触孔的半导体器件包括暴露接触焊盘的突起
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Application No.: US11850208Application Date: 2007-09-05
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Publication No.: US08026604B2Publication Date: 2011-09-27
- Inventor: Byung-yoon Kim
- Applicant: Byung-yoon Kim
- Applicant Address: KR
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR
- Agency: Myers Bigel Sibley & Sajovec
- Priority: KR10-2006-0089133 20060914
- Main IPC: H01L23/52
- IPC: H01L23/52

Abstract:
Semiconductor devices are provided including a semiconductor substrate and a first interlayer insulating layer on the semiconductor substrate. A contact pad is provided in the first interlayer insulating layer and a second insulating layer is provided on the first interlayer insulating layer. A contact hole is provided in the second interlayer insulating layer. The contact hole exposes the contact pad and a lower portion of the contact hole has a protrusion exposing the contact pad. The protrusion is provided on the second interlayer insulating layer. A contact spacer is provided on inside sidewalls of the contact hole and fills the protrusion. A contact plug is provided in the contact hole. Related methods are also provided herein.
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