Invention Grant
US08026718B2 Magnetic sensor, hall element, hall IC, magnetoresistive effect element, method of fabricating hall element, and method of fabricating magnetoresistive effect element 失效
磁传感器,霍尔元件,霍尔IC,磁阻效应元件,霍尔元件制造方法以及制造磁阻效应元件的方法

  • Patent Title: Magnetic sensor, hall element, hall IC, magnetoresistive effect element, method of fabricating hall element, and method of fabricating magnetoresistive effect element
  • Patent Title (中): 磁传感器,霍尔元件,霍尔IC,磁阻效应元件,霍尔元件制造方法以及制造磁阻效应元件的方法
  • Application No.: US12193851
    Application Date: 2008-08-19
  • Publication No.: US08026718B2
    Publication Date: 2011-09-27
  • Inventor: Makoto MiyoshiMitsuhiro Tanaka
  • Applicant: Makoto MiyoshiMitsuhiro Tanaka
  • Applicant Address: JP Nagoya
  • Assignee: NGK Insulators, Ltd.
  • Current Assignee: NGK Insulators, Ltd.
  • Current Assignee Address: JP Nagoya
  • Agency: Burr & Brown
  • Priority: JP2007-220815 20070828; JP2008-167455 20080626
  • Main IPC: G01R33/07
  • IPC: G01R33/07
Magnetic sensor, hall element, hall IC, magnetoresistive effect element, method of fabricating hall element, and method of fabricating magnetoresistive effect element
Abstract:
An aspect of the present invention provides a magnetic sensor which is operated better at a high temperature range not lower than 300° C. compared with a conventional magnetic sensor. A operating layer having a heterojunction interface is formed by laminating a first layer made of GaN whose electron concentration is not more than 1×1016/cm3 at room temperature and a second layer made of AlxGa1-xN (0
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