Invention Grant
- Patent Title: Roll to roll nanoimprint lithography
- Patent Title (中): 滚动式纳米压印光刻
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Application No.: US12100363Application Date: 2008-04-09
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Publication No.: US08027086B2Publication Date: 2011-09-27
- Inventor: Lingjie Jay Guo , Se Hyun Ahn
- Applicant: Lingjie Jay Guo , Se Hyun Ahn
- Applicant Address: US MI Ann Arbor
- Assignee: The Regents Of The University Of Michigan
- Current Assignee: The Regents Of The University Of Michigan
- Current Assignee Address: US MI Ann Arbor
- Agency: Harness, Dickey & Pierce, P.L.C.
- Main IPC: G02B5/30
- IPC: G02B5/30

Abstract:
Apparatus and methods for a nano-patterning process to fabricate nanostructures. A roller type mold is used to continuously imprint nanostructures onto a flexible web or a rigid substrate. The process includes a coating and an imprinting module, which rotate the web synchronously. Liquid resist materials are used for imprinting and the patterns are set by thermal or UV curing. The process is used to produce bilayer metal wire-grid polarizers, organic solar cells, and organic light emitting diodes.
Public/Granted literature
- US20090046362A1 ROLL TO ROLL NANOIMPRINT LITHOGRAPHY Public/Granted day:2009-02-19
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