Invention Grant
- Patent Title: Method for analyzing defect data and inspection apparatus and review system
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Application No.: US11472368Application Date: 2006-06-22
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Publication No.: US08027527B2Publication Date: 2011-09-27
- Inventor: Hisae Shibuya , Yuji Takagi
- Applicant: Hisae Shibuya , Yuji Takagi
- Applicant Address: JP Tokyo JP Tokyo
- Assignee: Hitachi, Ltd.,Hitachi High-Technologies Corporation
- Current Assignee: Hitachi, Ltd.,Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo JP Tokyo
- Agency: Antonelli, Terry, Stout & Kraus, LLP.
- Priority: JP2001-110794 20010410; JP2001-173411 20010608; JP2001-292786 20010926
- Main IPC: G06K9/00
- IPC: G06K9/00

Abstract:
The distribution states of defects are analyzed on the basis of the coordinates of defects detected by an inspection apparatus to classify them into a distribution feature category, or any one of repetitive defect, congestion defect, linear distribution defect, ring/lump distribution defect and random defect. In the manufacturing process for semiconductor substrates, defect distribution states are analyzed on the basis of defect data detected by an inspection apparatus, thereby specifying the cause of defect in apparatus or process.
Public/Granted literature
- US20060238755A1 Method for analyzing defect data and inspection apparatus and review system Public/Granted day:2006-10-26
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