Invention Grant
- Patent Title: Planar controlled zone microwave plasma system
- Patent Title (中): 平面控制区微波等离子体系统
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Application No.: US12555459Application Date: 2009-09-08
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Publication No.: US08028654B2Publication Date: 2011-10-04
- Inventor: Edward B. Ripley , Roland D. Seals , Jonathan S. Morrell
- Applicant: Edward B. Ripley , Roland D. Seals , Jonathan S. Morrell
- Applicant Address: US TN Oak Ridge
- Assignee: Babcock & Wilcox Technical Services Y-12, LLC
- Current Assignee: Babcock & Wilcox Technical Services Y-12, LLC
- Current Assignee Address: US TN Oak Ridge
- Agency: Luedeka, Neely & Graham, P.C.
- Main IPC: C23C16/00
- IPC: C23C16/00 ; C23F1/00 ; H01L21/306 ; H05B31/26

Abstract:
An apparatus and method for initiating a process gas plasma. A conductive plate having a plurality of conductive fingers is positioned in a microwave applicator. An arc forms between the conductive fingers to initiate the formation of a plasma. A transport mechanism may convey process materials through the plasma. A spray port may be provided to expel processed materials.
Public/Granted literature
- US20100089534A1 Planar Controlled Zone Microwave Plasma System Public/Granted day:2010-04-15
Information query
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