Invention Grant
US08028654B2 Planar controlled zone microwave plasma system 有权
平面控制区微波等离子体系统

Planar controlled zone microwave plasma system
Abstract:
An apparatus and method for initiating a process gas plasma. A conductive plate having a plurality of conductive fingers is positioned in a microwave applicator. An arc forms between the conductive fingers to initiate the formation of a plasma. A transport mechanism may convey process materials through the plasma. A spray port may be provided to expel processed materials.
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