Invention Grant
US08029224B2 Substrate transfer apparatus, substrate transfer method, and storage medium
有权
基板转印装置,基板转印方法和存储介质
- Patent Title: Substrate transfer apparatus, substrate transfer method, and storage medium
- Patent Title (中): 基板转印装置,基板转印方法和存储介质
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Application No.: US12076648Application Date: 2008-03-20
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Publication No.: US08029224B2Publication Date: 2011-10-04
- Inventor: Yo Abe , Mitsuru Obara , Takahiro Abe
- Applicant: Yo Abe , Mitsuru Obara , Takahiro Abe
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Smith, Gambrell & Russell, LLP
- Priority: JP2007-077530 20070323
- Main IPC: H01L21/00
- IPC: H01L21/00 ; G01N21/86

Abstract:
A substrate transfer apparatus 100 includes a substrate transport means 4 having a transport base 5 and a plurality of retention arms 41a-41e for retaining substrates W, an optical sensor 62 that is used to define a horizontal optical axis L, an elevator means 52 for moving the transport base 5 up and down, and a height detection means 54 for detecting the height of the transport base 5 relative to the optical axis L. In accordance with a light-reception/no-light-reception detection result fed from the optical sensor 62 and the height of the transport base 5, a judgment means 72a of a control section 7 judges whether the postures of the retention arms 41a-41e relative to the horizontal plane are normal. When the judgment means 72a judges that the postures of the retention arms 41a-41e relative to the horizontal plane are abnormal, the control section 7 exercises control to stop the substrate transport means 4.
Public/Granted literature
- US20080232937A1 Substrate transfer apparatus, substrate transfer method, and storage medium Public/Granted day:2008-09-25
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