Invention Grant
- Patent Title: Multilayer retaining ring for chemical mechanical polishing
- Patent Title (中): 用于化学机械抛光的多层固定环
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Application No.: US12427642Application Date: 2009-04-21
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Publication No.: US08029640B2Publication Date: 2011-10-04
- Inventor: Steven M. Zuniga , Thomas H. Osterheld
- Applicant: Steven M. Zuniga , Thomas H. Osterheld
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Fish & Richardson P.C.
- Main IPC: B24B5/00
- IPC: B24B5/00 ; B24B29/00
Abstract:
A carrier head for a chemical mechanical polishing apparatus includes a retaining ring having a flexible lower portion and a rigid upper portion.
Public/Granted literature
- US20090221223A1 MULTILAYER RETAINING RING FOR CHEMICAL MECHANICAL POLISHING Public/Granted day:2009-09-03
Information query
