Invention Grant
- Patent Title: Nanoimprint method and apparatus
- Patent Title (中): 纳米压印方法和装置
-
Application No.: US12063088Application Date: 2006-08-17
-
Publication No.: US08029717B2Publication Date: 2011-10-04
- Inventor: Kazuya Nakamura , Nobuo Imaizumi , Yoshihito Hiyama , Ryutaro Maeda , Hiroshi Goto
- Applicant: Kazuya Nakamura , Nobuo Imaizumi , Yoshihito Hiyama , Ryutaro Maeda , Hiroshi Goto
- Applicant Address: JP
- Assignee: Namiki Seimitsu Houseki Kabushiki Kaisha
- Current Assignee: Namiki Seimitsu Houseki Kabushiki Kaisha
- Current Assignee Address: JP
- Agency: Studebaker & Brackett PC
- Agent Donald R. Studebaker
- Priority: JP2005-236354 20050817; JP2006-138720 20060518
- International Application: PCT/JP2006/316144 WO 20060817
- International Announcement: WO2007/020962 WO 20070222
- Main IPC: B29C59/00
- IPC: B29C59/00

Abstract:
There is provided a nanoimprint apparatus. The nanoimprint apparatus transfers a pattern formed on a surface of a mold to a transfer layer which is formed partially or entirely on a side surface of a substantially cylindrical or columnar substrate. The nanoimprint apparatus includes: a first jig which is in contact with the substrate 102; a second jig which rotatably supports the first jig; a press unit which is connected to the second jig to press the substrate on the mold 104 through the first and second jigs; and a movable holding unit which holds the mold and moves the mold 104 in a direction substantially perpendicular to a pressing force.
Public/Granted literature
- US20100065986A1 NANOIMPRINT METHOD AND APPARATUS Public/Granted day:2010-03-18
Information query