Invention Grant
- Patent Title: Method of fabricating structures based on nanoparticles
- Patent Title (中): 基于纳米粒子制造结构的方法
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Application No.: US12155668Application Date: 2008-06-06
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Publication No.: US08029722B2Publication Date: 2011-10-04
- Inventor: Tomi Mattila , Ari Alastalo , Mark Allen , Heikki Seppä
- Applicant: Tomi Mattila , Ari Alastalo , Mark Allen , Heikki Seppä
- Applicant Address: FI Espoo
- Assignee: Valtion Teknillinen Tutkimuskeskus
- Current Assignee: Valtion Teknillinen Tutkimuskeskus
- Current Assignee Address: FI Espoo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: FI20075431 20070608
- Main IPC: B29C67/00
- IPC: B29C67/00 ; H05B7/00 ; H01L21/82

Abstract:
This publication discloses a method for creating nanoscale formations. According to the method, a filler matrix and first nanoparticles embedded in the filler matrix, and two conductive electrodes are superimposed on the insulating material layer. According to the invention, a voltage is applied between the conductive electrodes, a filler matrix is used and first nanoparticles have substantially different electrical properties in order to induce self-organized localized contact creation when said voltage is applied. Potential applications of the invention include e.g. parallel-plate capacitor structures based on metal-oxide nanoparticles, such as memory cells, and high-permittivity/tunable capacitors.
Public/Granted literature
- US20090081431A1 Structures based on nanoparticles and method for their fabrication Public/Granted day:2009-03-26
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