Invention Grant
- Patent Title: High temperature decomposition of hydrogen peroxide
- Patent Title (中): 过氧化氢的高温分解
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Application No.: US10923163Application Date: 2004-08-12
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Publication No.: US08029736B2Publication Date: 2011-10-04
- Inventor: Clyde F. Parrish
- Applicant: Clyde F. Parrish
- Applicant Address: US DC Washington
- Assignee: The United States of America as represented by the Administrator of the National Aeronautics and Space Administration
- Current Assignee: The United States of America as represented by the Administrator of the National Aeronautics and Space Administration
- Current Assignee Address: US DC Washington
- Agent Randall M. Heald; Thomas W. Leffert
- Main IPC: B01D50/00
- IPC: B01D50/00
Abstract:
Nitric oxide (NO) is oxidized into nitrogen dioxide (NO2) by the high temperature decomposition of a hydrogen peroxide solution to produce the oxidative free radicals, hydroxyl and hydroperoxyl. The hydrogen peroxide solution is impinged upon a heated surface in a stream of nitric oxide where it decomposes to produce the oxidative free radicals. Because the decomposition of the hydrogen peroxide solution occurs within the stream of the nitric oxide, rapid gas-phase oxidation of nitric oxide into nitrogen dioxide occurs.
Public/Granted literature
- US20050019229A1 High temperature decomposition of hydrogen peroxide Public/Granted day:2005-01-27
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