Invention Grant
- Patent Title: Integrated method and system for manufacturing monolithic panels of crystalline solar cells
- Patent Title (中): 晶体太阳能电池单块面板的集成方法和系统
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Application No.: US12399248Application Date: 2009-03-06
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Publication No.: US08030119B2Publication Date: 2011-10-04
- Inventor: Tirunelveli S. Ravi , Ananda H. Kumar , Ashish Asthana
- Applicant: Tirunelveli S. Ravi , Ananda H. Kumar , Ashish Asthana
- Applicant Address: US CA Santa Clara
- Assignee: Crystal Solar, Inc.
- Current Assignee: Crystal Solar, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Agent David H. Jaffer
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
A method for fabricating a photovoltaic (PV) cell panel wherein all PV cells are formed simultaneously on a two-dimensional array of monocrystalline silicon mother wafers affixed to a susceptor is disclosed. Porous silicon separation layers are anodized in the surfaces of the mother wafers. The porous film is then smoothed to form a suitable surface for epitaxial film growth. An epitaxial reactor is used to grow n- and p-type films forming the PV cell structures. Contacts to the n- and p-layers are deposited, followed by gluing of a glass layer to the PV cell array. The porous silicon film is then separated by exfoliation in a peeling motion across all the cells attached together above, followed by attaching a strengthening layer on the PV cell array. The array of mother wafers may be reused multiple times, thereby reducing materials costs for the completed solar panels.
Public/Granted literature
- US20090227063A1 Integrated method and system for manufacturing monolithic panels of crystalline solar cells Public/Granted day:2009-09-10
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