Invention Grant
US08030124B2 Method for patterning an organic material to concurrently form an insulator and a semiconductor and device formed thereby 有权
用于图案化有机材料以同时形成绝缘体的方法和由其形成的半导体和器件

  • Patent Title: Method for patterning an organic material to concurrently form an insulator and a semiconductor and device formed thereby
  • Patent Title (中): 用于图案化有机材料以同时形成绝缘体的方法和由其形成的半导体和器件
  • Application No.: US11718332
    Application Date: 2005-11-02
  • Publication No.: US08030124B2
    Publication Date: 2011-10-04
  • Inventor: Fredericus J. TouwslagerGerwin H. Gelinck
  • Applicant: Fredericus J. TouwslagerGerwin H. Gelinck
  • Applicant Address: NL Breda
  • Assignee: Creator Technology B.V.
  • Current Assignee: Creator Technology B.V.
  • Current Assignee Address: NL Breda
  • International Application: PCT/IB2005/053583 WO 20051102
  • International Announcement: WO2006/048833 WO 20060511
  • Main IPC: H01L21/00
  • IPC: H01L21/00
Method for patterning an organic material to concurrently form an insulator and a semiconductor and device formed thereby
Abstract:
A method for fabricating an electronic device includes forming a layer of precursor material for forming a semi-conductor material in a cured state and exposing the precursor material to light. The precursor is heated in the presence of the light to form an insulator in areas exposed to light and a semiconductor in areas not exposed to the light. The light is preferably in the visible range. Suitable precursors may include 6,13-dihydro-6,13-(2,3,4,5-tetrachloro-2,4-cyclohexadieno)-pentacene (202) to form, for example, pentacene (204) as the semiconductor and 6,13-pentacenequinone (206) as an insulator. A device made in accordance with the method is also included.
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