Invention Grant
- Patent Title: Spray method for producing semiconductor nano-particles
- Patent Title (中): 喷涂半导体纳米粒子的方法
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Application No.: US11663454Application Date: 2005-09-22
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Publication No.: US08030194B2Publication Date: 2011-10-04
- Inventor: Lilac Amirav , Efrat Lifshitz
- Applicant: Lilac Amirav , Efrat Lifshitz
- Applicant Address: IL Haifa
- Assignee: Technion Research and Development Foundation Ltd.
- Current Assignee: Technion Research and Development Foundation Ltd.
- Current Assignee Address: IL Haifa
- Agency: Browdy and Neimark, PLLC
- International Application: PCT/IL2005/001013 WO 20050922
- International Announcement: WO2006/035425 WO 20060406
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
A method is provided for producing semiconductor nanoparticles comprising: (i) dissolving a semiconductor compound or mixture of semiconductor compounds in a solution; (ii) generating spray droplets of the resulting solution of semiconductor compound(s); (iii) vaporizing the solvent of said spray droplets, consequently producing a stream of unsupported semiconductor nanoparticles; and (iv) collecting said unsupported semiconductor nanoparticles on a support.
Public/Granted literature
- US20090263956A1 Spray method for producing semiconductor nano-particles Public/Granted day:2009-10-22
Information query
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