Invention Grant
- Patent Title: Heat treatment method for preventing substrate deformation
- Patent Title (中): 防止基板变形的热处理方法
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Application No.: US12922827Application Date: 2009-03-16
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Publication No.: US08030225B2Publication Date: 2011-10-04
- Inventor: In Goo Jang , Yoo Jin Lee , Dong Jee Kim
- Applicant: In Goo Jang , Yoo Jin Lee , Dong Jee Kim
- Applicant Address: KR Hwaseong-Si, Gyeonggi-Do
- Assignee: TG Solar Corporation
- Current Assignee: TG Solar Corporation
- Current Assignee Address: KR Hwaseong-Si, Gyeonggi-Do
- Agency: Mannava & Kang, PC
- Agent Hyunho Park
- Priority: KR10-2008-0024567 20080317
- International Application: PCT/KR2009/001296 WO 20090316
- International Announcement: WO2009/116763 WO 20090924
- Main IPC: H01L21/324
- IPC: H01L21/324

Abstract:
A heat treatment method which can prevent heat deformation of a substrate caused during a heat treatment process on the substrate with a thin film formed on its surface is provided. The heat treatment method in accordance with the present invention includes (a) stacking a second substrate 10b on a first substrate 10a; and (b) stacking a weight 20 on the second substrate 10b, wherein the first substrate 10a and the second substrate 10b are stacked, with thin films 12 of the substrates 10a and 10b being in contact with each other. In accordance with the present invention, deformation of the substrate can be prevented by stacking the substrates, with thin films formed on the substrates being in contact with each other, and placing a weight on the stacked substrates during the heat treatment process.
Public/Granted literature
- US20110039421A1 HEAT TREATMENT METHOD Public/Granted day:2011-02-17
Information query
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