Invention Grant
US08030263B2 Composition for stripping and cleaning and use thereof 有权
用于剥离和清洁的组合物及其用途

Composition for stripping and cleaning and use thereof
Abstract:
A composition comprising one or more water soluble organic solvents comprising a glycol ether; water; a fluoride containing compound provided that if the fluoride containing compound is ammonium fluoride than no additional fluoride containing compound is added to the composition; optionally a quaternary ammonium compound; and optionally a corrosion inhibitor is disclosed herein that is capable of removing residues from an article such as photoresist and/or etching residue. Also disclosed herein is a method for removing residues from an article using the composition disclosed herein.
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