Invention Grant
- Patent Title: Process for producing polymer for semiconductor lithography
- Patent Title (中): 半导体光刻用聚合物的制造方法
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Application No.: US12519371Application Date: 2007-12-20
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Publication No.: US08030419B2Publication Date: 2011-10-04
- Inventor: Takanori Yamagishi , Ichiro Kato , Satoshi Yamaguchi , Kouzo Osaki , Yasuo Shibata , Isao Magara , Hideki Omori , Kensuke Iuchi
- Applicant: Takanori Yamagishi , Ichiro Kato , Satoshi Yamaguchi , Kouzo Osaki , Yasuo Shibata , Isao Magara , Hideki Omori , Kensuke Iuchi
- Applicant Address: JP Tokyo
- Assignee: Maruzen Petrochemical Co., Ltd.
- Current Assignee: Maruzen Petrochemical Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2006-346454 20061222
- International Application: PCT/JP2007/001447 WO 20071220
- International Announcement: WO2008/078410 WO 20080703
- Main IPC: C08F2/06
- IPC: C08F2/06
Abstract:
To provide a method for producing a polymer for semiconductor lithography which can attain high uniformity in the polymer from lot to lot. The method for producing a polymer for semiconductor lithography includes the step (P) of heating a polymerizable monomer and a polymerization initiator in a solvent, to thereby polymerize the monomer, the step (P) having the step of controlling a polymerization pressure by regulating a liquid level in a container (WO) which is disposed between a polymerization tank and the atmospheric air and which provides liquid sealing.
Public/Granted literature
- US20100048848A1 PROCESS FOR PRODUCING POLYMER FOR SEMICONDUCTOR LITHOGRAPHY Public/Granted day:2010-02-25
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