Invention Grant
US08031433B2 Method to make an integrated side shield PMR head with non conformal side gap
有权
制造具有非保形侧间隙的集成侧屏PMR头的方法
- Patent Title: Method to make an integrated side shield PMR head with non conformal side gap
- Patent Title (中): 制造具有非保形侧间隙的集成侧屏PMR头的方法
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Application No.: US12231756Application Date: 2008-09-05
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Publication No.: US08031433B2Publication Date: 2011-10-04
- Inventor: Cherng-Chyi Yan , Feiyue Li , Shiwen Huang , Jiun-Ting Lee , Yoshitaka Sasaki
- Applicant: Cherng-Chyi Yan , Feiyue Li , Shiwen Huang , Jiun-Ting Lee , Yoshitaka Sasaki
- Applicant Address: US CA Milpitas
- Assignee: Headway Technologies, Inc.
- Current Assignee: Headway Technologies, Inc.
- Current Assignee Address: US CA Milpitas
- Agency: Saile Ackerman LLC
- Agent Stephen B. Ackerman
- Main IPC: G11B5/127
- IPC: G11B5/127

Abstract:
A non-conformal integrated side shield structure is disclosed for a PMR write head wherein the sidewalls of the side shield are not parallel to the pole tip sidewalls. Thus, the side gap distance between the leading pole tip edge and side shield is different than the side gap distance between the trailing pole tip edge and side shield. As a result, there is a reduced side fringing field and improved overwrite performance. The side gap distance is constant with increasing distance from the ABS along the main pole layer. A fabrication method is provided where the trailing shield and side shield are formed in the same step to afford a self-aligned shield structure. Adjacent track erasure induced by flux choking at the side shield and trailing shield interface can be eliminated by this design. The invention encompasses a tapered main pole layer in a narrow pole tip section.
Public/Granted literature
- US20100061016A1 Method to make an integrated side shield PMR head with non conformal side gap Public/Granted day:2010-03-11
Information query
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