Invention Grant
- Patent Title: Surface emitting semiconductor laser and method for fabricating the same
- Patent Title (中): 表面发射半导体激光器及其制造方法
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Application No.: US12559609Application Date: 2009-09-15
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Publication No.: US08031755B2Publication Date: 2011-10-04
- Inventor: Masahiro Yoshikawa
- Applicant: Masahiro Yoshikawa
- Applicant Address: JP Tokyo
- Assignee: Fuji Xerox Co., Ltd.
- Current Assignee: Fuji Xerox Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Fildes & Outland, P.C.
- Priority: JP2009-030596 20090213
- Main IPC: H01S5/183
- IPC: H01S5/183

Abstract:
A surface emitting semiconductor laser includes: a substrate; a first semiconductor multilayer reflection mirror of a first conduction type; an active region; a second semiconductor multilayer reflection mirror of a second conduction type; a first selectively oxidized layer that is formed in one of the first and second semiconductor multilayer reflection mirrors and includes a first oxidized region selectively oxidized, and a first conductive region surrounded by the first oxidized region; and a second selectively oxidized layer that is formed in one of the first and second semiconductor multilayer reflection mirrors and includes a second oxidized region selectively oxidized, and a second conductive region surrounded by the second oxidized region. A first semiconductor layer next to the first selectively oxidized layer has an Al composition greater than that of a second semiconductor layer next to the second selectively oxidized layer, the first conductive region having a size smaller than that of the second conductive region.
Public/Granted literature
- US20100208760A1 SURFACE EMITTING SEMICONDUCTOR LASER AND METHOD FOR FABRICATING THE SAME Public/Granted day:2010-08-19
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