Invention Grant
- Patent Title: Semiconductor device including SRAM
- Patent Title (中): 半导体器件包括SRAM
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Application No.: US12323005Application Date: 2008-11-25
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Publication No.: US08035170B2Publication Date: 2011-10-11
- Inventor: Satoshi Inaba
- Applicant: Satoshi Inaba
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2007-304916 20071126
- Main IPC: H01L27/11
- IPC: H01L27/11

Abstract:
A semiconductor device according to an embodiment of the invention includes: a semiconductor substrate; device regions formed on the semiconductor substrate, the device regions having a length direction in a predetermined direction; a plurality of transistors having gate electrodes, respectively, the gate electrodes extending in a direction approximately perpendicular to the predetermined direction, the plurality of transistors having a source/drain region and a channel region having a channel direction approximately parallel to the predetermined direction in the device region; a plurality of SRAM cells disposed in an array, each of the plurality of SRAM cells including the plurality of transistors; and a dummy region made of the substantially same material as that of the device regions, the dummy region being formed between the outermost device regions of the SRAM cells adjacent to each other in the direction approximately perpendicular to the predetermined direction, the dummy region having a length direction approximately parallel to the predetermined direction.
Public/Granted literature
- US20090134472A1 SEMICONDUCTOR DEVICE Public/Granted day:2009-05-28
Information query
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