Invention Grant
US08035175B2 Field effect transistor for detecting ionic material and method of detecting ionic material using the same
有权
用于检测离子材料的场效应晶体管及使用其的离子材料检测方法
- Patent Title: Field effect transistor for detecting ionic material and method of detecting ionic material using the same
- Patent Title (中): 用于检测离子材料的场效应晶体管及使用其的离子材料检测方法
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Application No.: US11613258Application Date: 2006-12-20
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Publication No.: US08035175B2Publication Date: 2011-10-11
- Inventor: Jeo-young Shim , Kyu-sang Lee , Kyu-tae Yoo , Won-seok Chung
- Applicant: Jeo-young Shim , Kyu-sang Lee , Kyu-tae Yoo , Won-seok Chung
- Applicant Address: KR
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR
- Agency: Cantor Colburn LLP
- Priority: KR10-2006-0037723 20060426
- Main IPC: H01L27/14
- IPC: H01L27/14

Abstract:
A field effect transistor for detecting ionic material and a method of detecting ionic material using the field effect transistor. The field effect transistor for detecting ionic material includes a substrate formed of a semiconductor material, a source region and a drain region spaced apart from each other in the substrate and doped with an opposite conductivity type to that of the substrate, a channel region interposed between the source region and the drain region, an insulating layer disposed on the channel region and formed of an electrically insulating material, a first reference electrode disposed at an edge of the upper portion of the insulating layer and a second reference electrode disposed to be spaced apart from the insulating layer.
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