Invention Grant
- Patent Title: Exposure apparatus, exposure method, and device producing method
- Patent Title (中): 曝光装置，曝光方法和装置制造方法
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Application No.: US11660921Application Date: 2005-12-09
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Publication No.: US08035799B2Publication Date: 2011-10-11
- Inventor: Yoshiki Kida
- Applicant: Yoshiki Kida
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, PLC
- Priority: JP2004-356535 20041209; JP2005-350685 20051205
- International Application: PCT/JP2005/022634 WO 20051209
- International Announcement: WO2006/062188 WO 20060615
- Main IPC: G03B27/42
- IPC: G03B27/42 ; G03B27/52
Abstract:
An exposure apparatus is provided with a measuring unit which measures at least one of property and components of a liquid in a state that a liquid immersion area is formed on an object different from a substrate P to be exposed. There is provided an exposure apparatus which can accurately perform exposure process and measurement process through the liquid by judging the state of the liquid in advance and by performing a procedure as appropriate.
Public/Granted literature
- US20070252960A1 Exposure Apparatus, Exposure Method, and Device Producing Method Public/Granted day:2007-11-01
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