Invention Grant
US08037433B2 System and methodology for determining layout-dependent effects in ULSI simulation
有权
用于确定ULSI仿真中与布局有关的影响的系统和方法
- Patent Title: System and methodology for determining layout-dependent effects in ULSI simulation
- Patent Title (中): 用于确定ULSI仿真中与布局有关的影响的系统和方法
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Application No.: US12196471Application Date: 2008-08-22
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Publication No.: US08037433B2Publication Date: 2011-10-11
- Inventor: Dureseti Chidambarrao , Tong Li , Richard Q. Williams , David W. Winston
- Applicant: Dureseti Chidambarrao , Tong Li , Richard Q. Williams , David W. Winston
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Scully, Scott, Murphy & Presser, P.C.
- Agent H. Daniel Schnurmann
- Main IPC: G06F17/50
- IPC: G06F17/50

Abstract:
A layout of a semiconductor circuit is analyzed to calculate layout-dependant parameters that can include a mobility shift and a threshold voltage shift. Layout-dependant effects that affect the layout dependant parameters may include stress effects, rapid thermal anneal (RTA) effects, and lithographic effects. Intrinsic functions that do not reflect the layout-dependant effects are calculated, followed by calculation of scaling modifiers based on the layout-dependant parameters. A model output function that reflects the layout-dependant effects is obtained by multiplication of each of the intrinsic functions with a corresponding scaling parameter.
Public/Granted literature
- US20100050138A1 SYSTEM AND METHODOLOGY FOR DETERMINING LAYOUT-DEPENDENT EFFECTS IN ULSI SIMULATION Public/Granted day:2010-02-25
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